16/07/2026
Enlitech 受邀參加 Failure Analysis Workshop (EDFA 2026)🎉
Enlitech 很榮幸受邀出席 Failure Analysis Workshop (EDFA 2026)，並與 TSMC、Marvel、lAMD、Qualcomm、ZEISS（蔡司）、SEMICAPS、National University of Singapore (NUS) 及 SmartAC 等全球半導體領導企業與研究機構共同交流。
本次 Workshop 匯聚半導體製造、晶片設計、失效分析、設備技術與學術研究領域的重要專家，聚焦先進封裝（Advanced Packaging）、Chiplets、汽車電子失效分析（Automotive Failure Analysis）、矽光子（Silicon Photonics）、奈米探針（Nanoprober）及 AI 時代可靠度驗證等關鍵技術議題。
透過此次國際交流平台，Enlitech 將持續深化於先進半導體檢測、光子晶片分析與矽光子失效分析技術領域的技術布局，並與全球產業鏈夥伴共同推動下一世代半導體製造與可靠度驗證技術發展。
於 EDFA Workshop 2026 期間，光焱科技總經理 Dr. Joseph Liao 將發表技術演講，隨著矽光子（Silicon Photonics）逐步應用於高速光互連（High-Speed Optical Interconnects）、資料中心（Data Centers）及共封裝光學（ CPO）架構，如何快速定位光學缺陷、分析光損耗分布並提升晶圓製造良率，已成為先進半導體產業的重要挑戰。
本次分享將介紹 Enlitech Spectral Imaging 技術，透過直接觀察矽光子積體電路（Silicon Photonic Integrated Circuits, PICs）內部光傳播行為，建立光學損耗映射（Optical Loss Mapping），實現高效率缺陷定位、失效分析（Failure Analysis）與晶圓級檢測（Wafer-Level Screening），展現 Enlitech 在下一世代光子半導體檢測技術領域的創新能力。
📅 活動日期：2026 年 7 月 17 日（星期五）
🕘 時間：08:45–18:00
📍 地點：新加坡國立大學（National University of Singapore, NUS）Block E7, #03-08/09, Seminar Room 3/4 15 Kent Ridge Crescent, Singapore 119276
查看更多資訊：
https://shine.nus.edu.sg/2026/07/06/nus-edfas-failure-analysis-workshop-2026/
Enlitech Invited to the Failure Analysis Workshop (EDFA 2026)
Enlitech is honored to participate in the Failure Analysis Workshop (EDFA 2026) alongside global leaders in the semiconductor industry, including TSMC, Marvell, AMD, Qualcomm, ZEISS, SEMICAPS, the National University of Singapore (NUS), and SmartAC.
This year's workshop brings together experts from semiconductor manufacturing, IC design, failure analysis, equipment technologies, and academic research to discuss key topics including Advanced Packaging, Chiplets, Automotive Failure Analysis, Silicon Photonics, Nanoprober technologies, and reliability verification for the AI era.
Through this international platform, Enlitech continues to strengthen its expertise in advanced semiconductor inspection, photonic integrated circuit (PIC) characterization, and silicon photonics failure analysis, while collaborating with global industry partners to accelerate next-generation semiconductor manufacturing and reliability technologies.
During EDFA 2026, Dr. Joseph Liao, General Manager of Enlitech, will present a technical talk addressing one of the industry's emerging challenges. As Silicon Photonics becomes increasingly adopted for high-speed optical interconnects, data centers, and Co-Packaged Optics (CPO), the ability to rapidly identify optical defects, visualize optical loss distribution, and improve wafer manufacturing yield has become increasingly critical.
The presentation will introduce Enlitech's Spectral Imaging technology, which directly visualizes light propagation inside Silicon Photonic Integrated Circuits (PICs) to generate Optical Loss Maps for efficient defect localization, failure analysis, and wafer-level screening. The talk will highlight Enlitech's innovative approach to next-generation photonic semiconductor inspection and characterization.
📅 Date: July 17, 2026 (Friday)
🕘 Time: 08:45–18:00
📍 Venue:National University of Singapore (NUS)Block E7, #03-08/09, Seminar Room 3/4 15 Kent Ridge Crescent Singapore 119276
For more information:
https://shine.nus.edu.sg/2026/07/06/nus-edfas-failure-analysis-workshop-2026/
