02/06/2026
A new E-Beam evaporation system is ready to leave Italy and head to Spain, where it will support the activities of a private research laboratory.
The system has been designed to deliver high performance in the deposition of materials with high melting points, including titanium, tungsten, molybdenum, gold and oxides. In these applications, electron beam technology provides a decisive advantage in terms of process control, coating purity and deposition stability.
Why choose an E-Beam source?
It enables extremely high temperatures while focusing the energy directly on the source material. This approach helps reduce unnecessary heating of the overall system, limits contamination risks and supports a stable deposition process.
Key benefits include:
• Extremely high operating temperatures
• Minimal contamination
• Precise deposition rate control
• Excellent film uniformity
• High coating purity
By concentrating energy through electron bombardment, E-Beam evaporation is particularly effective for R&D environments that require reliable results, repeatable processes and advanced thin film deposition capabilities.
From Italy to Spain, supporting research ideas as they evolve into stable and scalable coating processes.
Discover our evaporation systems:
https://www.kenosistec.com/en/evaporation-system/